About Newway

As a pioneer in the photomask industry in China, Shenzhen Newway Photomask Making Co., Ltd. is dedicated to the R&D, production, and sales of photomasks. As a key material in the semiconductor and display manufacturing sectors, the company provides specialized photomask products and efficient follow-up services to renowned downstream display panel makers, wafer fabs, IC design houses, and packaging & testing companies. Over nearly three decades, through continuous independent R&D innovation and steady production capacity expansion, Newway has become a leading domestic supplier of high-generation, high-precision flat panel display (FPD) photomasks and advanced packaging photomasks.
In the semiconductor field, Newway's photomasks are comprehensively applied in IC manufacturing, IC devices, advanced packaging, and other areas. The investment in the Suzhou Luxin Semiconductor 130-28nm semiconductor photomask project further refines the company's semiconductor photomask layout, continuously drives photomask technology iteration and upgrades, and promotes the process of domestic substitution to better meet downstream customer demands.
In the display field, Newway's photomasks achieve full-generation coverage (G2.5 to G11) for display panels and support all display technologies (including LCD, AMOLED, LTPS, LTPO, Mini-LED, Micro-LED, Silicon-based OLED, FMM photomasks, etc.). To further expand the production capacity for high-generation, high-precision photomasks, the company has established a presence in Xiamen, constructing the "Xiamen Newway Photomask Making High-Generation, High-Precision Photomask Production Base Project." This project primarily focuses on producing G8.6 and below high-precision photomasks for AMOLED and other applications. It aims to enhance China's core competitiveness in the global display industry chain, responding to the national "Strengthening and Supplementing Industrial Chains" strategy, and contributing to the advancement of China's high-end manufacturing.
Currently, Newway has established an initial large-scale layout, with Shenzhen as its headquarters, and three major production bases in Chengdu, Suzhou, and Xiamen (under construction), along with a Hong Kong subsidiary, Suzhou branch, and Taiwan office. Upholding the business philosophy of "Customer First, People-oriented, NEWWAY Thought, Perfection Pursuit," NEWWAY is committed to building a world-leading enterprise in the photomask industry, repaying society with strength and sincerity.
  • Founded
    1997

    Founded

  • China's First G11 TFT Photomask Production Line
    G11

    China's First G11 TFT Photomask Production Line

  • China's Only Domestic R&D and Manufacturing Enterprise with Full-Generation Photomask Capability
    NO.1

    China's Only Domestic R&D and Manufacturing Enterprise with Full-Generation Photomask Capability

Company Profile
Photomask for Display

Photomask for Display

In the display field (TFT), the company's display photomask has achieved full-generation coverage (G2.5-G11) and full-display technology coverage (LCD, AMOLED, LTPS, LTPO, Mini-LED, Micro-LED, silicon-based OLED, FMM photomasks, etc.).
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Photomask for Semiconductors

Photomask for Semiconductors

In the semiconductor field, NEWWAY's semiconductor photomasks are widely applied in Integrated Circuits (IC), semiconductor devices, advanced packaging, and more. Through the investment in Luxin Semiconductor, the company's semiconductor photomask layout has advanced to the 40nm process node, with future plans to extend further to the 28nm node.
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APPLICATION AREAS

Large-Size HD Display & Touch
Large-Size HD Display & Touch
IC Devices
IC Devices
IC Packaging
IC Packaging
Integrated Circuit Manufacturing
Integrated Circuit Manufacturing

News

Newway Photomask Wraps Up Successful Run at SEMICON/FPD China 2026

SHANGHAI, March 27 — The three-day global semiconductor flagship event, SEMICON/FPD China 2026, drew to a successful close on Thursday at the Shanghai New International Expo Centre. As one of the most influential gatherings in the global semiconductor industry, the exhibition brought together leading enterprises from across the upstream and downstream supply chains, both domestic and international, to explore new trends in industrial innovation and development.
Shenzhen Newway Photomask Co., Ltd. (stock code: 688401), a listed private company in the display and semiconductor photomask sector, made a powerful impression with its presence at the event.
2026-03-31

Official Recognition: NEWWAY's LTPS Photomask Earn Inclusion in Sichuan Provincial "First Batch in Cina" New Materials List.

Recently, the Department of Economy and Information Technology of Sichuan Province officially announced the list of the 2025 Sichuan Provincial First Set Major Technical Equipment, First Batch New Materials , and First Edition Key Software Products. The LTPS (Low Temperature Polycrystalline Silicon) photomask, independently developed and manufactured by NEWWAY, was successfully recognized as one of the Sichuan provincial "First Batch in China" New Material due to its core technological breakthroughs. This recognition signifies another major breakthrough of NEWWAY in the field of core materials for high-end displays, achieving official recognition of its technological strength and industrialization level.
2026-03-18
Liu Renyuan, member of the Standing Committee of the Chengdu Municipal Party Committee and Secretary of the Party Working Committee of Chengdu High tech Zone, and his delegation visited NEWWAY Optoelectronics for research and carried out the work of

Liu Renyuan, a Member of the Standing Committee of the CPC Chengdu Municipal Committee and Secretary of the Working Committee of the CPC Committee at Chengdu High-tech Zone, and His Delegation Visited NEWWAY and Carried out the Work of "Visiting Enterprises, Solving Problems, Improving Services, and Promoting Development".

On August 18th, Liu Renyuan, member of the Standing Committee of the Chengdu Municipal Party Committee and Secretary of the Party Working Committee of Chengdu High tech Zone, led a team to visit NEWWAY Optoelectronics Chengdu Base to conduct a special research on "entering enterprises, solving problems, providing excellent services, and promoting development".
2025-08-19
NEWWAY Optoelectronics Half tone Photomask Won DIC EXPO 2025 Innovation Gold Award for Core Technology Empowering Display Industry Upgrade

NEWWAY's Halftone Photomask Wins DIC EXPO 2025 Gold Award: Core Technology Empowers Display Industry Upgrade

On August 11, 2025, at the just concluded DIC EXPO 2025 International Display Technology and Application Innovation Exhibition, NEWWAY Optoelectronics independently developed? The half tone photomask won the highest award at the exhibition, the "Display Material Innovation Gold Award".
2025-08-11